XPS investigation of the reaction of carbon with NO, O2, N2 and H2O plasmas
J.L. Hueso, J.P. Espinós, A. Caballero, J. Cotrino, A.R. González-Elipe
Carbon, 45 (2007) 89-96
doi: 10.1016/j.carbon.2006.07.021
Global model of a low pressure ECR microwave plasma applied to the PECVD of SiO2 thin films
A. Yanguas-Gil, J. Cotrino, A.R. González-Elipe
Journal of Physics D: Applied Physics, 40 (2007) 3411-3422
doi: 10.1088/0022-3727/40/11/023
Plasma catalysis over lanthanum substituted perovskites
J.L. Hueso, A. Caballero, J. Cotrino, A.R. González-Elipe
Catalysis Communications, 9 (2007) 1739-1742
doi: 10.1016/j.catcom.2007.02.001
Optically Active Thin Films Deposited by Plasma Polymerization of Dye Molecules
A. Barranco, F. Aparicio, A. Yanguas-Gil, P. Groening, J. Cotrino, A.R. González-Elipe
Chemical Vapor Deposition, 13 (2007) 319–325
doi: 10.1002/cvde.200606552
Factors that Contribute to the Growth of Ag@TiO2 Nanofibers by Plasma Deposition
A. Borrás, A. Barranco, J.P. Espinós, J. Cotrino, J.P. Holgado, A.R. González-Elipe
Plasma Processes and Polymers, 4 (2007) 515-527
doi: 10.1002/ppap.200700013
Scaling behavior and mechanism of formation of SiO2 thin films grown by plasma-enhanced chemical vapor deposition
A. Yanguas-Gil, J. Cotrino, A. Walkiewicz-Pietrzykowska, A.R. González-Elipe
Physical Review B, 76 (2007) 075314 (1-8)
doi: 10.1103/PhysRevB.76.075314
Relationship between scaling behavior and porosity of plasma-deposited TiO2 thin films
A. Borrás, A. Yanguas-Gil, A. Barranco, J. Cotrino, A.R. González-Elipe
Physical Review B, 76 (2007) 235303 (1-8)
doi: 10.1103/PhysRevB.76.235303
2006
Influence of the Angular Distribution Function of Incident Particles on the Microstructure and Anomalous Scaling Behavior of Thin Films
A. Yanguas-Gil, J. Cotrino, A. Barranco, A.R. González-Elipe
Physical Review Letters, 96 (2006) 236101 (1-4)
doi: 10.1103/PhysRevLett.96.236101
Plasma Characterization of Oxygen-Tetramethylsilane Mixtures for the Plasma-Enhanced CVD of SiOxCyHz Thin Films
A. Yanguas-Gil, A. Barranco, J. Cotrino, P. Gröning, A.R. González-Elipe
Chemical Vapor Deposition, 12 (2006) 728-735
doi: 10.1002/cvde.200606496