2009

Growth Mechanism and Chemical Structure of Amorphous Hydrogenated Silicon Carbide (a-SiC:H) Films Formed by Remote Hydrogen Microwave Plasma CVD From a Triethylsilane Precursor: Part 1

A.M. Wrobel, A. Walkiewicz-Pietrzykowska, M. Ahola, I.J. Vayrynen, F.J. Ferrer, A.R. González-Elipe
Chemical Vapor Deposition, 15 (2009) 39-46
doi: 10.1002/cvde.200806726

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2007

Optically Active Thin Films Deposited by Plasma Polymerization of Dye Molecules

A. Barranco, F. Aparicio, A. Yanguas-Gil, P. Groening, J. Cotrino, A.R. González-Elipe
Chemical Vapor Deposition, 13 (2007) 319–325
doi: 10.1002/cvde.200606552

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2006

Plasma Characterization of Oxygen-Tetramethylsilane Mixtures for the Plasma-Enhanced CVD of SiOxCyHz Thin Films

A. Yanguas-Gil, A. Barranco, J. Cotrino, P. Gröning, A.R. González-Elipe
Chemical Vapor Deposition, 12 (2006) 728-735
doi: 10.1002/cvde.200606496

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