Microstructure of mixed oxide thin films prepared by magnetron sputtering at oblique angles
J. Gil-Rostra, F.J. García-García, F.J. Ferrer, A.R. González-Elipe, F. Yubero
Thin Solid Films, 591 (2015) 330-335
doi: 10.1016/j.tsf.2015.01.058
2014
Nanoindentation of nanocolumnar TiO2 thin films with single and stacked zig-zag layers
E. Jiménez-Piqué, L. González-García, V.J. Rico, A.R. González-Elipe
Thin Solid Films, 550 (2014) 444-449
doi: 10.1016/j.tsf.2013.10.022
2013
Preparation and characterization of CrO2 films by Low Pressure Chemical Vapor Deposition from CrO3
C. Aguilera, J.C. González, A. Borrás, D. Margineda, J.M. González, A.R. González-Elipe, J.P. Espinós
Thin Solid Films, 539 (2013) 1-11
doi: 10.1016/j.tsf.2013.04.118
Low refractive index SiOF thin films prepared by reactive magnetron sputtering
F.J. Garcia-Garcia, J. Gil-Rostra, A. Terriza, J.C. González, J. Cotrino, F. Frutos, F.J. Ferrer, A.R. González-Elipe, F. Yubero
Thin Solid Films, 542 (2013) 332-337
doi: 10.1016/j.tsf.2013.07.009
2011
Nitridation of nanocrystalline TiO2 thin films by treatment with ammonia
P. Romero-Gómez, V.J. Rico, J.P. Espinós, A.R. González-Elipe, R.G. Palgrave, R.G. Egdell
Thin Solid Films, 519 (2011) 3587–3595
doi: 10.1016/j.tsf.2011.01.267
2009
Electrical characteristics of mixed Zr–Si oxide thin films prepared by ion beam induced chemical vapor deposition at room temperature
F.J. Ferrer, F. Frutos, J. García-López, C. Jiménez, F. Yubero
Thin Solid Films, 517 (2009) 5446-5452
doi: 10.1016/j.tsf.2009.01.099
2008
Preparation and properties of La1−xAgyMnO3+δ thin epitaxial films
O.Y. Gorbenko, O.V. Melnikov, A.R. Kaul, L.I. Koroleva, N.A. Babushkina, A.N. Taldenkov, A.V. Inyushkin, A. Barranco, R. Szymczak
Thin Solid Films, 516 (2008) 3783–3790
doi: 10.1016/j.tsf.2007.06.120
2007
Optical refractive index and static permittivity of mixed Zr–Si oxide thin films prepared by ion beam induced CVD
F.J. Ferrer, F. Frutos, F.J. García-López, A.R. González-Elipe, F. Yubero
Thin Solid Films, 516 (2007) 481-485
doi: 10.1016/j.tsf.2007.07.139
2006
SiO2/TiO2 thin films with variable refractive index prepared by ion beam induced and plasma enhanced chemical vapor deposition
F. Gracia, F. Yubero, J.P. Holgado, J.P. Espinós, A.R. González-Elipe, T. Girardeau
Thin Solid Films, 500 (2006) 19-26
doi: 10.1016/j.tsf.2005.10.061
Analysis of texture and microstructure of anatase thin films by Fourier transform infrared spectroscopy
M. Ocaña, C. Pecharromán, F. Gracia, J.P. Holgado, A.R. González-Elipe
Thin Solid Films, 515 (2006) 1585-1591
doi: 10.1016/j.tsf.2006.05.022