Attenuation lengths of high energy photoelectrons in compact and mesoporous SiO2 films
F.J. Ferrer, J. Gil-Rostra, L. González-García, J. Rubio-Zuazo, P. Romero-Gómez, M.C. López-Santos, F. Yubero
Surface Science, 606 (2012) 820-824
doi: 10.1016/j.susc.2012.01.017
Influence of plasma-generated negative oxygen ion impingement on magnetron sputtered amorphous SiO2 thin films during growth at low temperatures
M. Macias-Montero, F.J. Garcia-Garcia, R. Álvarez, J. Gil-Rostra, J.C. González, J. Cotrino, A.R. Gonzalez-Elipe, A. Palmero
Journal of Applied Physics, 111 (2012) 054312
doi: 10.1063/1.3691950
Quantification of low levels of fluorine content in thin films
F.J. Ferrer, J. Gil-Rostra, A. Terriza, G. Rey, C. Jiménez, J. García-López, F. Yubero
Nuclear Instruments and Methods in Physics Research B, 274 (2012) 65-69
doi: 10.1016/j.nimb.2011.11.042
2011
Colored semi-transparent Cu-Si oxide thin films prepared by magnetron sputtering
J. Gil-Rostra, F. Yubero, R. Fernández, T. Vilajoana, P. Artús, J.C. Dürsteler, J. Cotrino, I. Ortega, A.R. González-Elipe
Optical Materials Express, 1 (2011) 1100-1112
doi: 10.1364/OME.1.001100
2010
On the microstructure of thin films grown by an isotropically directed deposition flux
R. Alvarez, P. Romero-Gómez, J. Gil-Rostra, J. Cotrino, F. Yubero, A. Palmero, A.R. González-Elipe
Journal of Applied Physics, 108 (2010) 064316 (7)
doi: 10.1063/1.3483242