R. Alvarez, P. Romero-Gómez, J. Gil-Rostra, J. Cotrino, F. Yubero, A. Palmero, A.R. González-Elipe
Journal of Applied Physics, 108 (2010) 064316 (7)
doi: 10.1063/1.3483242

The influence of isotropically directed deposition flux on the formation of the thin film microstructure at low temperatures is studied. For this purpose we have depositedTiO2TiO2thin films by two different deposition techniques: reactive magnetron sputtering, in two different experimental configurations, and plasma enhanced chemical vapor deposition. The obtained results indicate that filmsgrown under conditions where deposition particles do not possess a clear directionality, and in the absence of a relevant plasma/film interaction, present similar refractive indices no matter the deposition technique employed. The film morphology is also similar and consists of a granular surface topography and a columnarlike structure in the bulk whose diameter increases almost linearly with the film thickness. The deposition has been simulated by means of a Monte Carlo model, taking into account the main processes during growth. The agreement between simulations and experimental results indicates that the obtained microstructures are a consequence of the incorporation of low-energy, isotropically directed, deposition particles.

On the microstructure of thin films grown by an isotropically directed deposition flux