Growth of SiO2 and TiO2 thin films deposited by reactive magnetron sputtering and PECVD by the incorporation of non-directional deposition fluxes
R. Alvarez, P. Romero-Gomez, J. Gil-Rostra, J. Cotrino, F. Yubero, A.R. González-Elipe,A. Palmero
Physics Status Solidi A, 210 (2013) 796–801
doi: 10.1002/pssa.201228656