Precise determination of metal effective work function and fixed oxide charge in MOS capacitors with high-κ dielectric
M. Tapajna, K. Husekova, J.P. Espinós, L. Harmatha, K. Fröhlich
Materials Science in Semiconductor Processing, 9 (2006) 969-974
doi: 10.1016/j.mssp.2006.10.012
Characterization of rare earth oxides based MOSFET gate stacks prepared by metal-organic chemical vapour deposition
K. Fröhlich, R. Luptak, E. Dobrocka, K. Husekova, K. Cico, A. Rosova, M. Lukosius, A. Abrutis, P. Pisecny, J.P. Espinós
Materials Science in Semiconductor Processing, 9 (2006) 1065-1072
doi: 10.1016/j.mssp.2006.10.025