Wetting angles and photocatalytic activities of illuminated TiO2 thin films
V.J. Rico, P. Romero, J.L. Hueso, J.P. Espinós, A.R. González-Elipe
Catalysis Today, 143 (2009) 347-354
doi: 10.1016/j.cattod.2008.09.037
Chemical State of Nitrogen and Visible Surface and Schottky Barrier Driven Photoactivities of N-Doped TiO2 Thin Films
P. Romero-Gómez, V.J. Rico, A. Borrás, A. Barranco, J.P. Espinós, J. Cotrino, A.R. González-Elipe
Journal of Physical Chemistry C, 113 (2009) 13341–133
doi: 10.1021/jp9024816
Incorporation and Thermal Evolution of Rhodamine 6G Dye Molecules Adsorbed in Porous Columnar Optical SiO2 Thin Films
J.R. Sánchez-Valencia, I. Blaszczyk-Lezak, J.P. Espinós, S. Hamad, A.R. González-Elipe, A. Barranco
Langmuir, 25 (2009) 9140-9148
doi: 10.1021/la900695t
2008
“In situ” XPS studies of laser induced surface cleaning and nitridation of Ti
R. Lahoz, J.P. Espinós, G.F. de la Fuente, A.R. González-Elipe
Surface and Coatings Technology, 202 (2008) 1486–1492
doi: 10.1016/j.surfcoat.2007.06.061
Influence of the chemical and electronic structure on the electrical behavior of zirconium oxynitride films
P. Carvalho, J.M. Chappé, L. Cunha, S. Lanceros-Méndez, P. Alpuim, F. Vaz, E. Alves, C. Rousselot, J.P. Espinós, A.R. González-Elipe
Journal of Applied Physics, 103 (2008) 104907 (1-15)
doi: 10.1063/1.2927494
Preillumination of TiO2 and Ta2O5 photoactive thin films as a tool to tailor the synthesis of composite materials
J.R. Sánchez-Valencia, A. Borrás, A. Barranco, V.J. Rico, J.P. Espinós, A.R. González-Elipe
Langmuir, 24 (2008) 9460-9469
doi: 10.1021/la800773v
Nanostructural control in solution-derived epitaxial Ce1−xGdxO2−y films
M. Coll, J. Gázquez, F. Sandiumenge, T. Puig, X. Obradors, J.P. Espinós, R. Hühne
Nanotechnology, 19 (2008) 395601 (7pp)
doi: 10.1088/0957-4484/19/39/395601
2007
Elastic and orbital effects on thickness-dependent properties of manganite thin films
I.C. Infante, F. Sánchez, J. Fontcuberta, M. Wojcik, E. Jedryka, S. Estradé, F. Peiró, J. Arbiol, V. Laukhin, J.P. Espinós
Physical Review B, 76 (2007) 224415
doi: 10.1103/PhysRevB.76.224415
First nucleation steps during deposition of SiO2 thin films by plasma enhanced chemical vapour deposition
D. Dudeck, A. Yanguas-Gil, F. Yubero, J. Cotrino, J.P. Espinós, W. de la Cruz, A.R. González-Elipe
Surface Science, 601 (2007) 2223–2231
doi: 10.1016/j.susc.2007.03.027
Study of the first nucleation steps of thin films by XPS inelastic peak shape analysis
C. Mansilla, F. Gracia, A.I. Martin-Concepción, J.P. Espinós, J.P. Holgado, F. Yubero, A.R. González-Elipe
Surface and Interface Analysis, 39 (2007) 331-336
doi: 10.1002/sia.2509