First nucleation steps during deposition of SiO2 thin films by plasma enhanced chemical vapour deposition
D. Dudeck, A. Yanguas-Gil, F. Yubero, J. Cotrino, J.P. Espinós, W. de la Cruz, A.R. González-Elipe
Surface Science, 601 (2007) 2223–2231
doi: 10.1016/j.susc.2007.03.027
Si K-edge XANES study of SiOxCyHz amorphous polymeric materials
J. Chaboy, A. Barranco, A. Yanguas-Gil, F. Yubero, A.R. González-Elipe
Physical Review B, 75 (2007) 075205 (1-6)
doi: 10.1103/PhysRevB.75.075205
Global model of a low pressure ECR microwave plasma applied to the PECVD of SiO2 thin films
A. Yanguas-Gil, J. Cotrino, A.R. González-Elipe
Journal of Physics D: Applied Physics, 40 (2007) 3411-3422
doi: 10.1088/0022-3727/40/11/023
Optically Active Thin Films Deposited by Plasma Polymerization of Dye Molecules
A. Barranco, F. Aparicio, A. Yanguas-Gil, P. Groening, J. Cotrino, A.R. González-Elipe
Chemical Vapor Deposition, 13 (2007) 319–325
doi: 10.1002/cvde.200606552
Scaling behavior and mechanism of formation of SiO2 thin films grown by plasma-enhanced chemical vapor deposition
A. Yanguas-Gil, J. Cotrino, A. Walkiewicz-Pietrzykowska, A.R. González-Elipe
Physical Review B, 76 (2007) 075314 (1-8)
doi: 10.1103/PhysRevB.76.075314
2006
Measuring the electron temperature by optical emission spectroscopy in two temperature plasmas at atmospheric pressure: A critical approach
A. Barranco, A. Yanguas-Gil, F. Yubero, A.R. González-Elipe
Journal of Applied Physics, 99 (2006) 033104 (1-6)
doi: 10.1063/1.2170416
Analysis of SiOxCyHzSiOxCyHz polymeric materials by x-ray absorption spectroscopy: Anomalous behavior of the resonant SiKLLSiKLL Auger spectra
A. Barranco, A. Yanguas-Gil, F. Yubero, A.R. González-Elipe
Journal of Applied Physics, 100 (2006) 033706 (1-7)
doi: 10.1063/1.2222043
Plasma Characterization of Oxygen-Tetramethylsilane Mixtures for the Plasma-Enhanced CVD of SiOxCyHz Thin Films
A. Yanguas-Gil, A. Barranco, J. Cotrino, P. Gröning, A.R. González-Elipe
Chemical Vapor Deposition, 12 (2006) 728-735
doi: 10.1002/cvde.200606496