Plasma Characterization of Oxygen-Tetramethylsilane Mixtures for the Plasma-Enhanced CVD of SiOxCyHz Thin Films
A. Yanguas-Gil, A. Barranco, J. Cotrino, P. Gröning, A.R. González-Elipe
Chemical Vapor Deposition, 12 (2006) 728-735
doi: 10.1002/cvde.200606496