M. Macías-Montero, A. Borrás, Z. Saghi, J.P. Espinós, A. Barranco, J. Cotrino, A.R. González-Elipe
Nanotechnology, 23 (2012) 255303 (12p)
doi: 10.1088/0957-4484/23/25/255303

Supported ZnO nanorods have been prepared at 405 K by plasma-enhanced chemical vapour deposition (PECVD) using diethylzinc as precursor, oxygen plasma and silver as the promotion layer. The nanorods are characterized by a hollow and porous microstructure where partially percolated silver nanoparticles are located. By changing different deposition parameters like the thickness of the silver layer, the type of oxidation pretreatment or the geometry of the deposition set-up, the length, the width and the tilting angle of the nanorods with respect to the substrate can be modified. Other nanostructures like nanobushes, zigzag linear structures and stacked bilayers with nanocolumns of TiO2 can also be prepared by adjusting the deposition conditions. A phenomenological model relying on the assessment of the diverse nanostructure morphologies and the evidence provided by an in situ x-ray photoelectron spectroscopy (XPS) experiment has been proposed to describe their formation mechanism. From this analysis it is deduced that the effect of the electrical field of the plasma sheath, the high mobility of silver and silver oxide, and the diffusion of the precursor molecules are some of the critical factors that must converge by the formation of the nanorods.

Vertical and tilted Ag-NPs@ZnO nanorods by plasma-enhanced chemical vapour deposition
Etiquetado en: