R. Álvarez, L. González-García, P. Romero-Gómez, V.J. Rico, J. Cotrino, A.R. González-Elipe, A. Palmero
Journal of Physics D: Applied Physics, 44 (2011) 385302 (7)
doi: 10.1088/0022-3727/44/38/385302

The microstructural features of amorphous TiO2 thin films grown by the electron beam physical vapour deposition technique at oblique angles have been experimentally and theoretically studied. The microstructural features of the deposited films were characterized by considering both the column tilt angle and the increase in the column thickness with height. A Monte Carlo model of film growth has been developed that takes into account surface shadowing, short-range interaction between the deposition species and the film surface, as well as the angular broadening of the deposition flux when arriving at the substrate. The good match between simulations and experimental results indicates the importance of these factors in the growth and microstructural development of thin films deposited at oblique angles.

Theoretical and experimental characterization of TiO2 thin films deposited at oblique angles