L. González-García, J. Parra-Barranco, J.R. Sánchez-Valencia, A. Barranco, A. Borrás, A.R. González-Elipe, M.C. García-Gutiérrez, J.J. Hernández, D.R. Rueda, T.A. Ezquerra
Nanotechnology, 23 (2012) 205701 (10)
This paper reports a thorough microstructural characterization of glancing angle deposited (GLAD) TiO2 thin films. Atomic force microscopy (afm), grazing-incidence small-angle x-ray scattering (GISAXS) and water adsorption isotherms have been used to determine the evolution of porosity and the existence of some correlation distances between the nanocolumns constituting the basic elements of the film’s nanostructure. It is found that the deposition angle and, to a lesser extent, the film thickness are the most important parameters controlling properties of the thin film. The importance of porosity and some critical dimensions encountered in the investigated GLAD thin films is highlighted in relation to the analysis of their optical properties when utilized as antireflective coatings or as hosts and templates for the development of new composite materials.