J.L. Hueso, V.J. Rico, J.E. Frías, J. Cotrino, A.R. González-Elipe
Journal of Physics D: Applied Physics, 41 (2008) 092002 (4)
doi: 10.1088/0022-3727/41/9/092002

Ar + NO microwave discharges are used for sterilization and the results are compared with additional experiments with Ar, O₂ and N₂–O₂ plasma mixtures. The NO^* species produced in the Ar–NO mixtures remain up to long distances from the source, thus improving the sterilization efficiency of the process. E. coli individuals exposed to the Ar + NO plasma undergo morphological damage and cell lysis. Combined effects of etching (by O^* and Ar^* species) and UV radiation (from deactivation of NO^* species) are responsible for the higher activity found for this plasma mixture.