J. Gil-Rostra, F. Yubero, R. Fernández, T. Vilajoana, P. Artús, J.C. Dürsteler, J. Cotrino, I. Ortega, A.R. González-Elipe
Optical Materials Express, 1 (2011) 1100-1112
doi: 10.1364/OME.1.001100

Colored semi-transparent Cu-Si oxide thin films have been prepared by reactive magnetron sputtering from a single cathode of copper-silicon composition. Thin films of different composition and optical response were obtained by changing process parameters like the relative amount of copper in the target and the O₂/Ar mixture of the reactive plasma gas. The film characteristics were analyzed by several techniques. Their optical properties (refractive index, absorption coefficient, color) have been correlated with the process parameters used in the film preparation as well as with the film stoichiometry and chemistry.