A. Borrás, O. Groening, J. Koeble, P. Groening Advanced Materials 21, 4816 (2009) doi: 10.1002/adma.200901724
Optically Active Luminescent Perylene Thin Films Deposited by Plasma Polymerization
I. Blaszczyk-Lezak, F.J. Aparicio, A. Borrás, A. Barranco, A. Alvarez-Herrero, M. Fernández-Rodríguez, A.R. González-Elipe Journal of Physical Chemistry C, 113 (2009) 431-438 doi: 10.1021/jp807634j
Fabrication of ordered crystalline zirconium nanoporous membranes by an one-step procedure
F. Márquez, C. Morant, K.R. Pirota, A. Borrás, J.M. Sanz, E. Elizalde Nano Today, 4 (2009) 21-26 doi: 10.1016/j.nantod.2008.10.012
Porosity and microstructure of plasma deposited TiO2 thin films
A. Borrás, J.R. Sánchez-Valencia, J. Garrido-Molinero, A. Barranco, A.R. González-Elipe Microporous and Mesoporous Materials, 118 (2009) 314-324 doi: 10.1016/j.micromeso.2008.09.002
Surface nanostructuring of TiO2 thin films by ion beam irradiation
P. Romero-Gómez, A. Palmero, F. Yubero, M. Vinnichenko, A. Kolitsch, A.R. González-Elipe Scripta Materialia, 60 (2009) 574-577 doi: 10.1016/j.scriptamat.2008.12.014
Luminescent and Optical Properties of Nanocomposite Thin Films Deposited by Remote Plasma Polymerization of Rhodamine 6G
F.J. Aparicio, A. Borrás, I. Blaszczyk-Lezak, P. Gröning, A. Alvarez-Herrero, M. Fernández-Rodríguez, A.R. González-Elipe, A. Barranco Plasma Processes and Polymers, 6 (2009) 17-26 doi: 10.1002/ppap.200800092
Wetting Angles on Illuminated Ta2O5 Thin Films with Controlled Nanostructure
V.J. Rico, A. Borrás, F. Yubero, J.P. Espinós, F. Frutos, A.R. González-Elipe Journal of Physical Chemistry C, 113 (2009) 3775-3784 doi: 10.1021/jp805708w
Water plasmas for the revalorisation of heavy oils and cokes from petroleum refining
J.L. Hueso, V.J. Rico, J. Cotrino, J.M. Jiménez-Mateos, A.R. González-Elipe Environmetal Science and Technology, 43 (2009) 2557-2562 doi: 10.1021/es900236b
Growth Mechanism and Chemical Structure of Amorphous Hydrogenated Silicon Carbide (a-SiC:H) Films Formed by Remote Hydrogen Microwave Plasma CVD From a Triethylsilane Precursor: Part 1
A.M. Wrobel, A. Walkiewicz-Pietrzykowska, M. Ahola, I.J. Vayrynen, F.J. Ferrer, A.R. González-Elipe Chemical Vapor Deposition, 15 (2009) 39-46 doi: 10.1002/cvde.200806726
Electrical characteristics of mixed Zr–Si oxide thin films prepared by ion beam induced chemical vapor deposition at room temperature
F.J. Ferrer, F. Frutos, J. García-López, C. Jiménez, F. Yubero Thin Solid Films, 517 (2009) 5446-5452 doi: 10.1016/j.tsf.2009.01.099