2007

Determination of the hydrogen content in diamond-like carbon and polymeric thin films by reflection electron energy loss spectroscopy

V.J. Rico, F. Yubero, J.P. Espinós, J. Cotrino, A.R. González-Elipe, D. Garg, S. Henry
Diamond and Related Materials, 16 (2007) 107-111
doi: 10.1016/j.diamond.2006.04.002

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XPS investigation of the reaction of carbon with NO, O2, N2 and H2O plasmas

J.L. Hueso, J.P. Espinós, A. Caballero, J. Cotrino, A.R. González-Elipe
Carbon, 45 (2007) 89-96
doi: 10.1016/j.carbon.2006.07.021

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Global model of a low pressure ECR microwave plasma applied to the PECVD of SiO2 thin films

A. Yanguas-Gil, J. Cotrino, A.R. González-Elipe
Journal of Physics D: Applied Physics, 40 (2007) 3411-3422
doi: 10.1088/0022-3727/40/11/023

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Synthesis of undoped and Ni doped InTaO4 photoactive thin films by metal organic chemical vapor deposition

N. McSporran, V.J. Rico, A. Borrás, A.R. González-Elipe, G. Sauthier, E. György, J. Santiso, G. Garcia, A. Figueras, L. Parafianovic, A. Abrutis
Surface and Coatings Technology, 201 (2007) 9365-9368
doi: 10.1016/j.surfcoat.2007.04.049

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Plasma catalysis over lanthanum substituted perovskites

J.L. Hueso, A. Caballero, J. Cotrino, A.R. González-Elipe
Catalysis Communications, 9 (2007) 1739-1742
doi: 10.1016/j.catcom.2007.02.001

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Microstructure and transport properties of ceria and samaria doped ceria thin films prepared by EBE–IBAD

C. Mansilla, J.P. Holgado, J.P. Espinós, A.R. González-Elipe, F. Yubero
Surface and Coatings Technology, 202 (2007) 1256–1261
doi: 10.1016/j.surfcoat.2007.07.082

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Optically Active Thin Films Deposited by Plasma Polymerization of Dye Molecules

A. Barranco, F. Aparicio, A. Yanguas-Gil, P. Groening, J. Cotrino, A.R. González-Elipe
Chemical Vapor Deposition, 13 (2007) 319–325
doi: 10.1002/cvde.200606552

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Factors that Contribute to the Growth of Ag@TiO2 Nanofibers by Plasma Deposition

A. Borrás, A. Barranco, J.P. Espinós, J. Cotrino, J.P. Holgado, A.R. González-Elipe
Plasma Processes and Polymers, 4 (2007) 515-527
doi: 10.1002/ppap.200700013

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Scaling behavior and mechanism of formation of SiO2 thin films grown by plasma-enhanced chemical vapor deposition

A. Yanguas-Gil, J. Cotrino, A. Walkiewicz-Pietrzykowska, A.R. González-Elipe
Physical Review B, 76 (2007) 075314 (1-8)
doi: 10.1103/PhysRevB.76.075314

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Optical refractive index and static permittivity of mixed Zr–Si oxide thin films prepared by ion beam induced CVD

F.J. Ferrer, F. Frutos, F.J. García-López, A.R. González-Elipe, F. Yubero
Thin Solid Films, 516 (2007) 481-485
doi: 10.1016/j.tsf.2007.07.139

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