(P201230048 13.01.2012)


The process consists of the simultaneous deposition of a ceramic matrix, using a reactive magnetron sputtering source, and the evaporation of a metalorganic compound of at least one cation of the mixed oxide to be grown. The energy and strongly oxidizing plasma generated by the magnetron sputtering process is used to decompose the metalorganic precursor, leading to the reaction of the cation, coming from the metalorganic precursor, with the oxygen contained in the plasma, causing the deposition of an oxide film on the substrate. The metal is incorporated into the ceramic matrix in a proportion which depends on the relative speed of «evaporation» of the two sources involved.ormation of bone tissue without requiring the removal of the membrane.

Versatile and Economical Method of Manufacturing Mixed Oxides Thin Films