2006

SiO2/TiO2 thin films with variable refractive index prepared by ion beam induced and plasma enhanced chemical vapor deposition

F. Gracia, F. Yubero, J.P. Holgado, J.P. Espinós, A.R. González-Elipe, T. Girardeau
Thin Solid Films, 500 (2006) 19-26
doi: 10.1016/j.tsf.2005.10.061

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Analysis of texture and microstructure of anatase thin films by Fourier transform infrared spectroscopy

M. Ocaña, C. Pecharromán, F. Gracia, J.P. Holgado, A.R. González-Elipe
Thin Solid Films, 515 (2006) 1585-1591
doi: 10.1016/j.tsf.2006.05.022

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Theoretical determination of the surface excitation parameter from X-ray photoelectron spectroscopy

N. Pauly, S. Tougaard, F. Yubero
Surface and Interface Analysis, 38 (2006) 872-875
doi: 10.1002/sia.2173

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Intrinsic and extrinsic excitations in deep core photoelectron spectra of solid Ge

L. Kover, M. Novak, S. Egri, I. Cserny, Z. Berenyi, J. Toth, D. Varga, W. Drube, F. Yubero, S. Tougaard, W.S.M. Werner
Surface and Interface Analysis, 38 (2006) 569-573
doi: 10.1002/sia.2134

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First stages of growth of cerium oxide deposited on alumina and reduced titania surfaces

C. Mansilla, F. Yubero, M. Zier, R. Reiche, S. Oswald, J.P. Holgado, J.P. Espinós, A.R. González-Elipe
Surface and Interface Analysis, 38 (2006) 510-513
doi: 10.1002/sia.2269

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Correlation between optical properties and electronic parameters for mixed oxide thin films

F. Gracia, F. Yubero, J.P. Espinós, J.P. Holgado, A.R. González-Elipe, T. Girardeau
Surface and Interface Analysis, 38 (2006) 752-756 (2006)
doi: 10.1002/sia.2273

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Influence of the Angular Distribution Function of Incident Particles on the Microstructure and Anomalous Scaling Behavior of Thin Films

A. Yanguas-Gil, J. Cotrino, A. Barranco, A.R. González-Elipe
Physical Review Letters, 96 (2006) 236101 (1-4)
doi: 10.1103/PhysRevLett.96.236101

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Oscillating surface effect in reflection-electron-energy-loss spectra

N. Pauly, S. Tougaard, F. Yubero
Physical Review B, 73 (2006) 035402 (1-11)
doi: 10.1103/PhysRevB.73.035402

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Supported Ag–TiO2 core–shell nanofibres formed at low temperature by plasma deposition

A.I. Borrás, A. Barranco, F. Yubero, A.R. González-Elipe
Nanotechnology, 17 (2006) 3518-3522 
doi: 10.1088/0957-4484/17/14/026

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Precise determination of metal effective work function and fixed oxide charge in MOS capacitors with high-κ dielectric

M. Tapajna, K. Husekova, J.P. Espinós, L. Harmatha, K. Fröhlich
Materials Science in Semiconductor Processing, 9 (2006) 969-974
doi: 10.1016/j.mssp.2006.10.012

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