J.L. Hueso, V.J. Rico, J.E. Frías, J. Cotrino, A.R. González-Elipe
Journal of Physics D: Applied Physics, 41 (2008) 092002 (4)
doi: 10.1088/0022-3727/41/9/092002

Ar + NO microwave discharges are used for sterilization and the results are compared with additional experiments with Ar, O2 and N2–O2 plasma mixtures. The NO* species produced in the Ar–NO mixtures remain up to long distances from the source, thus improving the sterilization efficiency of the process. E. coli individuals exposed to the Ar + NO plasma undergo morphological damage and cell lysis. Combined effects of etching (by O* and Ar* species) and UV radiation (from deactivation of NO* species) are responsible for the higher activity found for this plasma mixture.

Ar + NO microwave plasmas for Escherichia coli sterilization
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